Title:
光酸発生剤、化学増幅レジスト組成物、およびそれを用いたパターン形成方法
Document Type and Number:
Japanese Patent JP4378872
Kind Code:
B2
Abstract:
A chemically amplified photo-resist contains a photoacid generator for changing the solubility of resin after exposure to 130-220 nanometer wavelength light, and the photoacid generator contains two kinds of sulfonium salt compound expressed by general formulae [1] and [2] so that the chemically amplified photo-resist is improved in resolution, sensitivity and smoothness on side surfaces of a transferred pattern.
Inventors:
Katsumi Maeda
Shigeyuki Iwasa
Kaichiro Nakano
Etsuo Hasegawa
Shigeyuki Iwasa
Kaichiro Nakano
Etsuo Hasegawa
Application Number:
JP2000347900A
Publication Date:
December 09, 2009
Filing Date:
November 15, 2000
Export Citation:
Assignee:
NEC
International Classes:
C09K3/00; C07C381/12; C07D311/22; C07D333/46; C07D335/02; C08K5/36; C08L101/14; G03F7/004; G03F7/038; G03F7/039; H01L21/027
Domestic Patent References:
| JP2002116546A | ||||
| JP2000267281A | ||||
| JP11344808A | ||||
| JP2000098612A | ||||
| JP9118663A | ||||
| JP2000281729A | ||||
| JP3567984B2 | ||||
| JP3351424B2 |
Attorney, Agent or Firm:
Sumio Tanai
Ryuichiro Mori
Hiroshi Watanabe
Naoki Matsuo
Ryuichiro Mori
Hiroshi Watanabe
Naoki Matsuo