Title:
マスクデータ作成方法
Document Type and Number:
Japanese Patent JP4389222
Kind Code:
B2
Abstract:
A method of creating data of a mask for manufacturing a semiconductor device. The mask includes at least one auxiliary pattern arranged adjacent to a line pattern. The at least one auxiliary pattern is allocated in accordance with a rule-based method on the basis of an interval between a first line pattern and a second line pattern adjacent to the first line pattern. Size of the at least one auxiliary pattern is then optimized in accordance with a model-based OPC (Optical Proximity Correction), by shifting edges of the at least one auxiliary pattern and edges for one of the line patterns on the basis of a first light intensity threshold on the at least one auxiliary pattern and a second light intensity threshold on the line patterns.
Inventors:
Nao Asato
Application Number:
JP2005133834A
Publication Date:
December 24, 2009
Filing Date:
May 02, 2005
Export Citation:
Assignee:
Elpida Memory Co., Ltd.
International Classes:
G03F1/36; G03F1/68; G03F1/70; H01L21/027; H01L21/82; H01L21/822; H01L27/04
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Foreign References:
| US20040170905 | ||||
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Attorney, Agent or Firm:
Kenho Ikeda
Shuichi Fukuda
Takashi Sasaki
Shuichi Fukuda
Takashi Sasaki