Title:
基板ハンドラー、リソグラフィ装置及びデバイス製造方法
Document Type and Number:
Japanese Patent JP4397913
Kind Code:
B2
Abstract:
An apparatus, method, and system is provided to condition a substrate. The apparatus can include a substrate handler, an array of diodes, and a projection system. The substrate handler can include a conditioning device, a float device, and a displacing device. The array of diodes can be configured to provide a patterned radiation beam, where the projection system projects the patterned radiation beam onto a target portion of a conditioned substrate.
Inventors:
Harmen Kras van der short
Hernes Jacobs
Bernardus Antonius Johannes Ruttic Huis
Petrus Matthews Henrix Fosters
Johannes Martinus Andreas Heisenberg
Aalto Adrián van Boizecom
Hernes Jacobs
Bernardus Antonius Johannes Ruttic Huis
Petrus Matthews Henrix Fosters
Johannes Martinus Andreas Heisenberg
Aalto Adrián van Boizecom
Application Number:
JP2006185665A
Publication Date:
January 13, 2010
Filing Date:
July 05, 2006
Export Citation:
Assignee:
AS M Netherlands B.V.
International Classes:
G03F7/20; H01L21/027; H01L21/683
Domestic Patent References:
| JP2001343753A | ||||
| JP2004296773A | ||||
| JP2004247335A | ||||
| JP2004241465A |
Foreign References:
| WO2003086917A1 |
Attorney, Agent or Firm:
Sakaki Morishita