Title:
電気的相互接続のためのスタンドオフ/マスク構造
Document Type and Number:
Japanese Patent JP4401241
Kind Code:
B2
Abstract:
The structure has an adhesive standoff layer attached to a liner layer. Standoff apertures (63) are formed in the liner layer and the adhesive standoff layer. A mask adhesive layer is attached to the liner layer. A mask liner layer (75) is attached to the mask adhesive layer. Mask apertures are formed in the mask adhesive layer and the mask liner layer in alignment with the standoff apertures. Independent claims are also included for the following: (a) a method of making a standoff/mask structure (b) a method of making an interconnected electrical circuit structure.
Inventors:
John Earl Andrews
Bradley Jay Garner
Richard Schumacher Tenberg The Third
Chad Slens
Samuel V Schultz
Bradley Jay Garner
Richard Schumacher Tenberg The Third
Chad Slens
Samuel V Schultz
Application Number:
JP2004156449A
Publication Date:
January 20, 2010
Filing Date:
May 26, 2004
Export Citation:
Assignee:
XEROX CORPORATION
International Classes:
H05K1/14; H05K3/32; H01L21/60; H01L21/68; H05K3/12; H05K3/46; H05K3/30; H05K3/34; H05K3/36
Domestic Patent References:
| JP2000100875A |
Foreign References:
| US5796590 |
Attorney, Agent or Firm:
Kenji Yoshida
Jun Ishida
Jun Ishida