Title:
平行平板電極を通じて電力を供給する誘電アンテナを有するプラズマ反応装置
Document Type and Number:
Japanese Patent JP4418534
Kind Code:
B2
Abstract:
The invention is embodied by a plasma reactor for processing a workpiece, including a reactor enclosure defining a processing chamber, a semiconductor window, a base within the chamber for supporting the workpiece during processing thereof, a gas inlet system for admitting a plasma precursor gas into the chamber, and an inductive antenna adjacent a side of the semiconductor window opposite the base for coupling power into the interior of the chamber through the semiconductor window electrode.
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Inventors:
Collins Kenneth
Rice michael
Troe Joan
Bukburger Douglas
Ascarian Eric
Tsui Joshua
Grokel david
Hung Raymond
Rice michael
Troe Joan
Bukburger Douglas
Ascarian Eric
Tsui Joshua
Grokel david
Hung Raymond
Application Number:
JP51064797A
Publication Date:
February 17, 2010
Filing Date:
August 28, 1996
Export Citation:
Assignee:
APPLIED MATERIALS,INCORPORATED
International Classes:
H01L21/3065; H05H1/46; A21D2/18; A23G3/34; A23G9/52; A23L1/308; A23L2/60; A23L9/10; A23L19/10; A23L27/30; A23L29/231; A23L29/238; A23L29/256; A23L29/269; H01J37/32; H01L21/302; H01L21/683
Domestic Patent References:
| JP7161702A | ||||
| JP7122544A | ||||
| JP7106096A | ||||
| JP8148472A |
Attorney, Agent or Firm:
Yoshiaki Anzai