Title:
パターンの形成方法及び配線パターンの形成方法
Document Type and Number:
Japanese Patent JP4433722
Kind Code:
B2
Abstract:
To provide a pattern forming method enabling a thin film to be patterned with high precision by easy and low cost techniques. A thin film 2 is provided on a base material 1 containing a sublimable dyestuff, light is irradiated to the base material 1 , and heat generated by the light irradiation sublimates the sublimable dyestuff in a desired region, thereby removing the thin film 2 corresponding to an irradiation region where the light is irradiated to thereby pattern this thin film 2.
Inventors:
Naoyuki Toyota
Application Number:
JP2003292469A
Publication Date:
March 17, 2010
Filing Date:
August 12, 2003
Export Citation:
Assignee:
Seiko Epson Corporation
International Classes:
B05D3/12; G03F7/004; B05D3/06; B41M5/24; G02B5/20; G02F1/1335; G02F1/1343; G03C8/00; G03F7/00; G03F7/36; H01L21/20; H01L51/00; H01L51/50; H05B33/10; H05B33/14; H05B33/26; H05K3/06; H05K3/14; B41M5/46
Domestic Patent References:
| JP2003211861A | ||||
| JP2002019008A | ||||
| JP2001164383A | ||||
| JP10301261A | ||||
| JP2000001055A | ||||
| JP6188186A |
Attorney, Agent or Firm:
Masahiko Ueyanagi
Osamu Suzawa
Osamu Suzawa