Title:
リソグラフィ装置およびデバイス製造方法
Document Type and Number:
Japanese Patent JP4445438
Kind Code:
B2
Abstract:
A lithographic apparatus is disclosed. The apparatus includes a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam. A projection system is configured to project the patterned radiation beam onto a target portion of a substrate. A first vacuum environment contains the projection system, a second vacuum environment contains the patterning device support, and a separator separates the first and second vacuum environments. The separator includes an aperture for passing the projection beam from the first vacuum environment towards the patterning device and/or vice-versa. The patterning device forms at least part of a seal for substantially sealing the aperture of the separator.
Inventors:
Bernardus Anthony Johannes Lutti Quiss
Petrus Rutgels Bar Tray
Johannes Henrix Wilhelms Jacobs
Thais Harlink
Paulus Martinus Maria Libreguts
Petrus Rutgels Bar Tray
Johannes Henrix Wilhelms Jacobs
Thais Harlink
Paulus Martinus Maria Libreguts
Application Number:
JP2005201993A
Publication Date:
April 07, 2010
Filing Date:
July 11, 2005
Export Citation:
Assignee:
AS M Netherlands B.V.
International Classes:
H01L21/027; G03F7/20
Domestic Patent References:
| JP2003332214A | ||||
| JP2003031483A | ||||
| JP2006049815A | ||||
| JP2006100363A | ||||
| JP2006016242A |
Attorney, Agent or Firm:
Yoshiyuki Inaba
Shinji Oga
Toshifumi Onuki
Shinji Oga
Toshifumi Onuki