Title:
フォトレジスト下層膜形成材料及びパターン形成方法
Document Type and Number:
Japanese Patent JP4496432
Kind Code:
B2
Inventors:
Jun Hatakeyama
Application Number:
JP2005042390A
Publication Date:
July 07, 2010
Filing Date:
February 18, 2005
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
G03F7/11; G03F7/26
Domestic Patent References:
| JP2004264710A | ||||
| JP2001215694A |
Attorney, Agent or Firm:
Takashi Kojima
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa