To provide a method for forming a laminated structure which yields uniform layers and enables patterning with few number of processes, moreover, without conducting accurate aligning between layers.

According to the method of forming the laminated structure, (A) at least a first layer 10, which is composed of a material that is turned from a conductive one into an insulating one, when exposed to energy rays, and a second layer 20 which is composed of a conductive material and leaves an area exposed to the energy rays, when exposed to the energy rays and developed, are laminated sequentially on a basic substance 1. (B) Then a laminated structure, consisting of the first and second layers 10, 20, is radiated locally with the energy rays and the second layer 20 is developed to form the first layer 10, consisting of a conductive area 10B which is not exposed to the energy rays, and an insulating area 10A which is exposed to the energy rays, and the second layer 20 consisting of an area 20A which is exposed to the energy rays.

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