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Title:
二重チャンバ装置およびその製造方法
Document Type and Number:
Japanese Patent JP4546460
Kind Code:
B2
Abstract:
A dual chamber apparatus including a first chamber and a second chamber which is configured to be coupled to the first chamber at an interface. Each of the first chamber and the second chamber has a transfer opening located at the interface. An insulating plate is located on one of the first chamber and the second chamber at the interface and is configured to have a low thermal conductivity such that the first chamber and the second chamber can be independently controlled at different temperatures when the first chamber and the second chamber are coupled together. Additionally, the apparatus may include an alignment device and/or a fastening device for fastening the first chamber to the second chamber. In embodiments, the insulating plate may be constructed of Teflon. Further, the first chamber may be a chemical oxide removal treatment chamber and the second chamber may be a heat treatment chamber.

Inventors:
Wallace, Jay
Hamelin, Thomas
Application Number:
JP2006507202A
Publication Date:
September 15, 2010
Filing Date:
March 16, 2004
Export Citation:
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Assignee:
東京エレクトロン株式会社
International Classes:
H01L21/3065; C23C16/44; C25D11/02; H01L21/00; H01L21/02; H01L21/677
Domestic Patent References:
JP11260881A
JP5211136A
JP9082650A
JP4360527A
Attorney, Agent or Firm:
Takehiko Suzue
Satoshi Kono
Makoto Nakamura
Kurata Masatoshi
Takashi Mine
Yoshihiro Fukuhara
Toshio Shirane
Sadao Muramatsu
Nobuhisa Nogawa
Ryo Hashimoto
Tetsuya Kazama