Title:
可視光応答型二酸化チタン光触媒薄膜とその作製法
Document Type and Number:
Japanese Patent JP4568866
Kind Code:
B2
Abstract:
To provide a method for depositing a sulfur-added titanium dioxide film which is a very thin film having around several hundred nanometers thickness and exhibits a photocatalytic property in visible light.
The visible light-responsive titanium dioxide photocatalyst thin film is manufactured by using a target material prepared by firing titanium disulfide (TiS2) and adding sulfur to the target material as an impurity by a laser vapor deposition method. The target material is prepared by firing compression-molded titanium disulfide in the air of 350-450°C. The temperature of a substrate on which the visible light-responsive titanium dioxide photocatalyst thin film is deposited is controlled to be 350-450°C and sulfur is deposited in vacuum.
COPYRIGHT: (C)2005,JPO&NCIPI
Inventors:
Haruya Yamamoto
Choi Nagaki
Rei Umebayashi
Masato Yoshikawa
Application Number:
JP2004029331A
Publication Date:
October 27, 2010
Filing Date:
February 05, 2004
Assignee:
Japan Atomic Energy Agency
International Classes:
B01J35/02; B01J27/02; C01G23/00; B01J37/02; C01G23/04; C23C14/08; C23C14/34
Domestic Patent References:
| JP2004000863A | | | | |
| JP2001205103A | | | | |
| JP2002028998A | | | | |
| JP4010378A | | | | |
Attorney, Agent or Firm:
Kazuo Shamoto
Shinjiro Ono
Yasushi Kobayashi
Akio Chiba
Hiroyuki Tomita
Shurin Sakurai
Fujihiro Kanda
Hideo Tanaka
Shinya Hosokawa
Norihiro Fukasawa
Koji Hirayama
