Title:
運転状態の監視方法
Document Type and Number:
Japanese Patent JP4570736
Kind Code:
B2
Inventors:
Shinji Sakano
Takeshi Sendota
Takeshi Sendota
Application Number:
JP2000201729A
Publication Date:
October 27, 2010
Filing Date:
July 04, 2000
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
H01L21/302; H01L21/3065; G05B23/02; H01L21/205
Domestic Patent References:
| JP7200040A |
Other References:
Barry M.Wise, et al.,Development and benchmarking of multivariate statisitcal process control tools for a semiconductor etch process: impact of measurement selection and data treatment on sensitivity,PROC. IFAC SYMP. ON FAULT DETECTION, SUPERVISION AND SAFETY FOR TECHNICAL PROCESSES,英国,IFAC,1998年,Vol.1,35-42
LEE S.F. ET AL.,RTSPC: A software utility for real-time SPC and tool data analysis,IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING,1995年 2月,Vol.8/No.1,17-25
MCDONALD C.J.,The evolution of intel's copy EXACTLY! Technology transfer method,INTEL TECHNOLOGY JOURNAL,米国,1998年,URL,http://developer.intel.com/technology/ itj/q41998/articles/art_2.htm
LEE S.F. ET AL.,RTSPC: A software utility for real-time SPC and tool data analysis,IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING,1995年 2月,Vol.8/No.1,17-25
MCDONALD C.J.,The evolution of intel's copy EXACTLY! Technology transfer method,INTEL TECHNOLOGY JOURNAL,米国,1998年,URL,http://developer.intel.com/technology/ itj/q41998/articles/art_2.htm
Attorney, Agent or Firm:
Hajime Ohara