To provide a vapor deposition apparatus which precisely detects the thickness of a film formed on a member to be vapor-deposited by precisely measuring an emitted amount of a vaporizing material.
This vapor deposition apparatus comprises: a first monitoring guide-tube 22 which is diverged from a first main guide-tube 21 and takes out one part of a first vaporizing material in the first main guide tube 21 for monitoring the emitted amount of the vaporizing material; and a first vaporization-rate-detecting sensor 8 which is arranged on a trajectory N1 of the first vaporizing material in the first monitoring guide-tube 22 and detects the film thickness. Thereby, the vapor deposition apparatus can detect the first vaporizing material having high density, which is emitted from the first monitoring guide-tube 22, can precisely grasp a varying amount of the first vaporizing material emitted from the first main guide-tube 21 toward a glass substrate 1, as a result, can precisely measure the vaporization rate of the first vaporizing material, and accordingly can precisely detect the thickness of the film formed on the glass substrate 1.
COPYRIGHT: (C)2006,JPO&NCIPI
Yuji Matsumoto
Ryoho Maeba
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