Title:
プラズマ強化プロセスにおいてウェブ材料を処理するための装置および方法
Document Type and Number:
Japanese Patent JP4585860
Kind Code:
B2
Abstract:
A device for treating a web material in a continuous plasma enhanced process includes a vacuum chamber (1) with device (2) for maintaining a constant reduced pressure within the chamber (1) and, arranged within the chamber (1), a rotating drum (3) for supporting and transporting the web (4), a magnetron device facing the web (4) supported and transported by the drum (3) and a gas supply device for supplying a process gas or process gas mixture to the space (10) between the drum and the magnetron device in which space (10) the plasma is sustained. The magnetron device has a plurality of independent magnetron electrodes (6) with rectangular magnetron faces arranged beside each other in parallel. Each magnetron electrode (6) is individually powered with an alternating voltage by its own power supply (7). The drum (3) is electrically grounded, floating or negatively biased.
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Inventors:
Faye, Pierre
Jaku, Bertrand
Jaku, Bertrand
Application Number:
JP2004540443A
Publication Date:
November 24, 2010
Filing Date:
September 09, 2003
Export Citation:
Assignee:
TETRA LAVAL HOLDINGS & FINANCE S.A.
International Classes:
C23C16/505; C23C14/35; C23C14/56; H01J37/32; H01J37/34; H05H1/46
Domestic Patent References:
| JP7502074A | ||||
| JP11092579A | ||||
| JP63103066A | ||||
| JP62083471A | ||||
| JP9324275A | ||||
| JP3087219A | ||||
| JP2001035839A | ||||
| JP9111460A |
Attorney, Agent or Firm:
Kuro Fukami
Toshio Morita
Yoshihei Nakamura
Yutaka Horii
Hisato Noda
Masayuki Sakai
Toshio Morita
Yoshihei Nakamura
Yutaka Horii
Hisato Noda
Masayuki Sakai