Title:
フォトマスク及びこれを利用した液晶表示装置用アレイ基板の製造方法
Document Type and Number:
Japanese Patent JP4594292
Kind Code:
B2
Abstract:
A photo-mask used for fabricating a photoresist pattern in process of fabricating an array substrate for a liquid crystal display device comprises a transmissive area having a first transmittance; a blocking area having a second transmittance; a first half-transmissive area including at least one coating layer and having a third transmittance; a second half-transmissive area including a plurality of bars and having a fourth transmittance, the bars having spaces therebetween, wherein the third and fourth transmittances are less than the first transmittance and greater than the second transmittance, respectively, and the third transmittance is greater than the fourth transmittance.
Inventors:
Quick hayeon
Application Number:
JP2006332789A
Publication Date:
December 08, 2010
Filing Date:
December 11, 2006
Export Citation:
Assignee:
LG Display Company Limited
International Classes:
G02F1/1368; G03F1/00; G03F1/68; H01L21/336; H01L29/786
Domestic Patent References:
| JP2002141512A | ||||
| JP2005215434A | ||||
| JP2004240401A | ||||
| JP2002350897A | ||||
| JP6186412A | ||||
| JP5094004A |
Attorney, Agent or Firm:
Okabe
Masao Okabe
Nobuaki Kato
Shinichi Usui
Takao Ochi
Asahi Shinmitsu
Katsumi Miyama
Masao Okabe
Nobuaki Kato
Shinichi Usui
Takao Ochi
Asahi Shinmitsu
Katsumi Miyama