Title:
フレア計測方法、露光方法、露光装置の調整方法
Document Type and Number:
Japanese Patent JP4599797
Kind Code:
B2
Abstract:
A flare measuring method and a flare measuring apparatus for measuring flaring occurring on optical systems, an exposure method and an exposure apparatus, and an exposure apparatus adjusting method capable of quantitatively measuring information regarding flare which occur on optical systems are to be provided. A flare measuring apparatus S for measuring flare which occur on optical system IL is provided with a light source device for irradiating an optical path including the optical system IL with an exposure light EL, a substrate M1 arranged on the optical path and provided with predetermined patterns C and T, a detecting device DT arranged on the image plane of a projecting optical system PL and capable of detecting information on the luminous energy of the light, and a control device CONT capable of controlling the irradiating range of the exposure light EL and acquiring information on flare on the basis of the result of detection of the exposure light EL by the detecting device DT.
Inventors:
Ikuo Hikima
Application Number:
JP2002514774A
Publication Date:
December 15, 2010
Filing Date:
June 26, 2001
Export Citation:
Assignee:
NIKON CORPORATION
International Classes:
H01L21/027; G01J1/00; G03F7/20
Domestic Patent References:
| JPH09270374A | 1997-10-14 |
Attorney, Agent or Firm:
Masatake Shiga
Tadashi Takahashi
Takashi Watanabe
Masakazu Aoyama
Kazuya Nishi
Yasuhiko Murayama
Tadashi Takahashi
Takashi Watanabe
Masakazu Aoyama
Kazuya Nishi
Yasuhiko Murayama