Title:
エッチング液組成物
Document Type and Number:
Japanese Patent JP4678559
Kind Code:
B2
Abstract:
An etching solution composition for an indium tin oxide transparent conductive film, comprising at least one member selected from oxalic acid, a naphthalene sulfonic acid condensate or a salt thereof, hydrochloric acid, sulfuric acid and a water-soluble amine and water. The etching solution composition can show an excellent ability of removing an etching residue on a transparent conductive film which is formed on a substrate without an under-layer film as well as a transparent conductive film which is formed on an under-layer film formed on a substrate, can also prevent the foam formation, causes no precipitation of any solid material, and therefore has a longer solution service life compared to a conventional one.
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Inventors:
Takashi Yamabe
Yoshitaka Nishijima
Yasue Hidekuni
Yoshihiro Mukai
Yoshitaka Nishijima
Yasue Hidekuni
Yoshihiro Mukai
Application Number:
JP2010270711A
Publication Date:
April 27, 2011
Filing Date:
December 03, 2010
Export Citation:
Assignee:
Nagase Chemtex Co., Ltd.
International Classes:
H01L21/308; G02F1/1343
Domestic Patent References:
| JP2005197397A | ||||
| JP2005243901A | ||||
| JP2003124203A | ||||
| JP2002164332A |
Attorney, Agent or Firm:
Shinya Furuya