Title:
層構造の製造方法
Document Type and Number:
Japanese Patent JP4700652
Kind Code:
B2
Abstract:
Laminar structure production produces a structure with a smoothed intermediate layer and another layer lying on top of it. The intermediate layer is treated with a gaseous etching agent containing hydrogen fluoride. Some material is thereby eroded, causing the intermediate layer to be made smooth.
Inventors:
Diego Fayehoe
Gunter Schwab
Thomas Bushhard
Gunter Schwab
Thomas Bushhard
Application Number:
JP2007118716A
Publication Date:
June 15, 2011
Filing Date:
April 27, 2007
Export Citation:
Assignee:
Siltronic AG
International Classes:
H01L21/302
Domestic Patent References:
| JP6168922A | ||||
| JP6151359A | ||||
| JP2000281497A | ||||
| JP8039753A | ||||
| JP9190999A | ||||
| JP2106927A | ||||
| JP2004533118A |
Foreign References:
| WO2005078786A1 |
Attorney, Agent or Firm:
Toshio Yano
Takuya Kuno
Einzel Felix-Reinhard
Reinhard Einsel
Takuya Kuno
Einzel Felix-Reinhard
Reinhard Einsel