Title:
プレーナ型導波路のためのゲルマニウムシリコンオキシナイトライド高屈折率薄膜
Document Type and Number:
Japanese Patent JP4746236
Kind Code:
B2
Abstract:
A composition represented by the formula Si1-xGexO2(1-y)N1.33y, wherein x is from about 0.05 to about 0.6 and y is from about 0.14 to about 0.74 exhibits properties highly suited for use in fabricating waveguides for liquid crystal based optical devices. In particular, the compositions have an index of refraction of from about 1.6 to about 1.8 for light at a wavelength of 1550 nm, and/or a coefficient of thermal expansion of from about 2.5x10-6°C-1 to about 5.0x10-6° C.-1. The compositions also have inherently low hydrogen content, and a high hydrogen permeability which allows better hydrogen removal by thermal annealing to provide a material which exhibits low optical losses and better etching properties than alternative materials.
Inventors:
Akwani Ikerionay.
Bellman Robert A.
Grundy Thomas Peas.
Sakunik Paul A.
Bellman Robert A.
Grundy Thomas Peas.
Sakunik Paul A.
Application Number:
JP2001536481A
Publication Date:
August 10, 2011
Filing Date:
October 10, 2000
Export Citation:
Assignee:
CORNING INCORPORATED
International Classes:
C03C3/11; C01B21/082; G02B6/12; C03B19/14; C03B32/00; C03C3/04; C03C17/02; G02F1/13357
Domestic Patent References:
| JP2000091079A |
Foreign References:
| FR2062743A1 |
Attorney, Agent or Firm:
Motohiko Fujimura