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Patent Searching and Data


Title:
プラズマ発生装置
Document Type and Number:
Japanese Patent JP4750879
Kind Code:
B2
Abstract:
A radio frequency plasma multiple-coil antenna allows for controllable, uniform inductive coupling within a plasma reactor. According to exemplary embodiments, multiple coils are positioned on a dielectric window of a plasma chamber, and are powered by a single radio frequency generator and tuned by a single matching network. Each coil is either planar or a combination of a planar coil and a vertically stacked helical coil. The input end of each coil is connected to an input tuning capacitor and the output end is terminated to the ground through an output tuning capacitor. The location of the maximum inductive coupling of the radio frequency to the plasma is mainly determined by the output capacitor, while the input capacitor is mainly used to adjust current magnitude into each coil. By adjusting the current magnitude and the location of the maximum inductive coupling within each coil, the plasma density in different radial and azimuthal regions can be varied and controlled, and therefore, radially and azimuthally uniform plasma can be achieved.

Inventors:
Chen, Gian, Jay.
Wiltrop, Robert, Gee.
Wicker, Thomas, Yi.
Application Number:
JP2009181946A
Publication Date:
August 17, 2011
Filing Date:
August 04, 2009
Export Citation:
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Assignee:
LAM RESEARCH CORPORATION
International Classes:
H05H1/46; H01J37/32; H01L21/205; H01L21/302; H01L21/3065
Domestic Patent References:
JP6177058A
JP10125497A
JP8195296A
JP7226383A
JP10083898A
JP8050998A
Foreign References:
US5587038
US5525159
WO1996018208A1
Attorney, Agent or Firm:
Yasunori Otsuka
Shiro Takayanagi
Yasuhiro Otsuka
Shuji Kimura
Nagakawa Yukimitsu