To provide a raster scanning charged particle exposure apparatus shortening drawing time of a sample by shortening the time when a charged particle beam is not irradiated to the sample, and improving the throughput, and also to provide a device manufacturing method using the charged particle exposure apparatus.

An exposure cycle is changed by controlling a blanker and a deflector such that the time when the charged particle beam is not irradiated to a sample is reduced within a time required for exposing one sheet of the sample. Consequently, drawing time of the sample is shortened and the throughput is improved. Device manufacturing efficiency is thereby improved in accordance with the device manufacturing method.

COPYRIGHT: (C)2006,JPO&NCIPI