Title:
デバイス製造方法、コンピュータプログラム、及び、リソグラフィ装置
Document Type and Number:
Japanese Patent JP4787282
Kind Code:
B2
Abstract:
A lithographic apparatus configured to apply corrections to the dose, within and/or between fields, to compensate for critical dimension variations due to heating of elements of the projection system is disclosed.
Inventors:
Van de Kerkhof, Marcus, Adrianis
Axsey, Muhammed
El Ou As Sud, Mamoun
Asahiri, Assis
Axsey, Muhammed
El Ou As Sud, Mamoun
Asahiri, Assis
Application Number:
JP2008045567A
Publication Date:
October 05, 2011
Filing Date:
February 27, 2008
Export Citation:
Assignee:
AS M Netherlands B.V.
International Classes:
G03F7/20; H01L21/027
Domestic Patent References:
| JP9162106A | ||||
| JP2000232049A | ||||
| JP2005183747A | ||||
| JP10064790A | ||||
| JP2001196305A | ||||
| JP2106917A | ||||
| JP6232029A | ||||
| JP2005116848A | ||||
| JP2000195771A |
Foreign References:
| US6552776 | ||||
| US20080252870 |
Attorney, Agent or Firm:
Yoshiyuki Inaba
Shinji Oga
Toshifumi Onuki
Shinji Oga
Toshifumi Onuki