Title:
基板上にマスクパターンを形成する方法
Document Type and Number:
Japanese Patent JP4792224
Kind Code:
B2
Abstract:
A method of forming a two-dimensional mask pattern on a substrate (1). The method comprises: (a) printing a non-electrically conductive material (2) on a substrate in a coarse version of a desired mask pattern; and (b) selectively ablating a portion of the material using a laser to refine the coarse pattern to form the desired mask pattern, thereby forming clearly defined and accurate gaps (4).
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Inventors:
Christoph Bitner
Martin Philip Gooch
Nigel Ingram Bromley
Martin Philip Gooch
Nigel Ingram Bromley
Application Number:
JP2005009325A
Publication Date:
October 12, 2011
Filing Date:
January 17, 2005
Export Citation:
Assignee:
FFI Limited
International Classes:
G03F1/08; H05K3/00; H05K3/28; H05K3/04; H05K3/06; H05K3/12
Domestic Patent References:
| JP59105638A | ||||
| JP2011773A | ||||
| JP56072438A |
Foreign References:
| US5147680 | ||||
| US4767489 |
Attorney, Agent or Firm:
Atsushi Nakajima
Kato Kazunori
Katsuichi Nishimoto
Kato Kazunori
Katsuichi Nishimoto