Title:
光路長が変更された異なる角度の光の合成により光学的に干渉する断層撮影におけるスペックルの減少
Document Type and Number:
Japanese Patent JP4805142
Kind Code:
B2
Inventors:
Guillermo Jay Turney
Niksar Iftimia
Brett E Bowma
Niksar Iftimia
Brett E Bowma
Application Number:
JP2006509619A
Publication Date:
November 02, 2011
Filing Date:
March 31, 2004
Export Citation:
Assignee:
The General Hospital Corporation
International Classes:
G01N21/17; A61B1/00; A61B5/00; A61B10/00; G01N21/47; G02B27/48; G01J9/02
Domestic Patent References:
| JP2003516531A | ||||
| JP2001272331A |
Foreign References:
| WO2001042735A1 | ||||
| WO2003012405A2 | ||||
| WO2001038820A1 |
Attorney, Agent or Firm:
Masayuki Masabayashi