Title:
低屈折率を有するフィルム用組成物
Document Type and Number:
Japanese Patent JP4805443
Kind Code:
B2
Abstract:
Use of a composition for preparing by radical route polymeric films having refractive index lower than 1.400, said composition comprising: a) a perfluoropolyether of formula: T'-Rf-T b) from 0.1 to 10% by weight of a perfluoropolyether of formula: T-Rf-CH2OH c) from 0 to 30% by weight of compounds selected from c1): compounds not containing fluorine: non fluorinated (meth)acrylic esters or vinyl monomers; or c2) compounds containing fluorine: mono(meth)acrylate perfluoropolyethers or perfluoroalkyl mono(meth)acrylates, d) from 0.01 to 10% by weight of a photoinitiator and/or radical initiators, the amount of component a) being the complement to 100 of the composition, with the proviso that defining by B0 the mole number of -CF2CH2OH and by B1 the sum of the moles of the (meth)acrylic end groups, the (B0 + B1)/B1 ratio is in the range 1.50-1.01.
Inventors:
Trulli, Stefano
Application Number:
JP2000165232A
Publication Date:
November 02, 2011
Filing Date:
June 01, 2000
Export Citation:
Assignee:
AUSIMONT S.p.A.
International Classes:
C08F290/06; C08F2/50; G02B1/11; C08F259/08; C08F290/04; C08F299/02; C08F299/06; C08G18/10; C08G18/50; C08G18/67; C08G18/81; C08G65/00; C08J5/18; C08L51/00; C09D4/00; C09D4/02; C09D151/00; C09D171/00; C09D175/16
Domestic Patent References:
JP10287719A | ||||
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JP10237130A | ||||
JP11349646A | ||||
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JP11080312A | ||||
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Foreign References:
WO1997035904A1 |
Attorney, Agent or Firm:
Keiichiro Saikyo
Takeshi Sugiyama
Minetarou Hirose
Mikio Takeuchi
Takeshi Sugiyama
Minetarou Hirose
Mikio Takeuchi