Title:
透明導電膜製造用の酸化物焼結体
Document Type and Number:
Japanese Patent JP4823386
Kind Code:
B2
Abstract:
The present invention provides an ITO amorphous transparent conductive film used in a display electrode for a flat panel display or the like, which can be produced without heating a substrate and without feeding water during the sputtering, while achieving both high etchability and lower resistivity at high levels. An oxide sintered compact containing indium oxide as a main component, while containing one or more elements selected from nickel, manganese, aluminum and germanium as a first additive element, with the total content of the first additive element being 2-12 atom % relative to the total content of indium and the first additive element.
Inventors:
Masakatsu Ikusawa
Masataka Yahagi
Masataka Yahagi
Application Number:
JP2010530836A
Publication Date:
November 24, 2011
Filing Date:
September 18, 2009
Export Citation:
Assignee:
jx Nippon Mining & Metals Co., Ltd.
International Classes:
C04B35/00; C23C14/08; H01B1/08; H01B5/14; H01B13/00
Domestic Patent References:
| JP2006188392A | 2006-07-20 | |||
| JPS62202415A | 1987-09-07 | |||
| JPS61136954A | 1986-06-24 | |||
| JPH08249929A | 1996-09-27 | |||
| JPH0378907A | 1991-04-04 | |||
| JPH0371510A | 1991-03-27 | |||
| JP2003239063A | 2003-08-27 | |||
| JP2004006221A | 2004-01-08 |
Attorney, Agent or Firm:
Axis International Patent Business Corporation