Title:
位置情報を取得するためのシステムおよび方法
Document Type and Number:
Japanese Patent JP4880232
Kind Code:
B2
Abstract:
A system and method for acquiring position information of a movable apparatus relevant to a specific axis is disclosed. In one embodiment, an interferometer generates first and second beams and various beam-steering members are located to define beam path segments for the two beams, but no beam path segment varies in length in unity with displacements of the movable apparatus along the specific axis. In another or the same embodiment, each beam path segment in which the first beam either impinges or has been reflected from the movable apparatus is symmetrical to a corresponding beam path segment of the second beam. The movable apparatus may be a wafer stage in which the "specific axis" is the exposure axis of a projection lens, but with all optical members which cooperate with the stage being located beyond the ranges of the wafer stage in directions perpendicular to the lithographic exposure axis.
Inventors:
William Clay Schulter
Louis F. Muller
Douglas Pee Woolverton
Jeffrey A Young
Alan Bee Ray
David Sea Chu
Louis F. Muller
Douglas Pee Woolverton
Jeffrey A Young
Alan Bee Ray
David Sea Chu
Application Number:
JP2005044034A
Publication Date:
February 22, 2012
Filing Date:
February 21, 2005
Export Citation:
Assignee:
AGILENT TECHNOLOGIES, INC.
International Classes:
G01B11/00; G03F7/20; H01L21/027
Domestic Patent References:
| JP5099612A | ||||
| JP2000039305A | ||||
| JP2001510577A |
Foreign References:
| WO2003019112A1 |
Attorney, Agent or Firm:
Shoichi Okuyama
Arihara Koichi
Matsushima Tetsuo
Arihara Koichi
Matsushima Tetsuo