Title:
スパッタリングターゲットとそれを用いたGe層、Ge化合物層、Ge合金層および光ディスク、電気・電子部品、磁気部品
Document Type and Number:
Japanese Patent JP4900992
Kind Code:
B2
Inventors:
Koichi Watanabe
Takashi Watanabe
Takashi Ishigami
Takashi Watanabe
Takashi Ishigami
Application Number:
JP2000220983A
Publication Date:
March 21, 2012
Filing Date:
July 21, 2000
Export Citation:
Assignee:
Toshiba Corporation
International Classes:
C23C14/34; C22C28/00; G11B7/26
Domestic Patent References:
| JP2000178724A | ||||
| JP10183341A | ||||
| JP10340489A | ||||
| JP10070089A | ||||
| JP6128737A | ||||
| JP2000038659A | ||||
| JP7090564A | ||||
| JP3150356A |
Foreign References:
| WO1998022636A1 |
Attorney, Agent or Firm:
Patent Business Corporation Sakura International Patent Office
Saichi Suyama
Saichi Suyama