Title:
光触媒作用による排ガスの精製方法および前記方法を実施するためのプラント
Document Type and Number:
Japanese Patent JP4907005
Kind Code:
B2
Abstract:
Process for the purification of gaseous effluents by a photocatalytic reaction, according to which, under ultraviolet radiation in a single stage, the gaseous effluent is subjected to movements by which at least one first substrate is lapped and by which a second substrate is traversed, the said first substrate and the said second substrate being covered with at least one photocatalysing agent.Plant for the implementation of the process.
Inventors:
Pierre Monzian
Christine Nguyen Din An
Francoise Delpeche
Jean-Claude Lou
Sylvie bourgeois
Alexis Steinbrün
Pierre Pischa
Jean Didier
Esther Meaton-Selman
Virginie blondie-patissiere
Leoni Bouvier
Joseph Dussault
Pierre Girard
Christine Nguyen Din An
Francoise Delpeche
Jean-Claude Lou
Sylvie bourgeois
Alexis Steinbrün
Pierre Pischa
Jean Didier
Esther Meaton-Selman
Virginie blondie-patissiere
Leoni Bouvier
Joseph Dussault
Pierre Girard
Application Number:
JP2000621048A
Publication Date:
March 28, 2012
Filing Date:
May 04, 2000
Export Citation:
Assignee:
Afulstrom Corporation
International Classes:
B01D53/86; B01D53/88; B01J19/12
Domestic Patent References:
| JP2501541A | ||||
| JP5026187U | ||||
| JP7227547A | ||||
| JP10151450A | ||||
| JP6011303B2 |
Foreign References:
| US5374405 |
Attorney, Agent or Firm:
Masatake Shiga
Takashi Watanabe
Yasuhiko Murayama
Shinya Mitsuhiro
Takashi Watanabe
Yasuhiko Murayama
Shinya Mitsuhiro