Title:
フォトマスクブランク及びフォトマスク、並びにフォトマスクを用いたパターン転写方法
Document Type and Number:
Japanese Patent JP4907688
Kind Code:
B2
Abstract:
A low reflective photomask blank suitable for shortened exposure wavelengths is disclosed. A photomask blank (1) having a single-layer or multilayer light-shielding film (3) arranged on a translucent substrate (2) and mainly containing a metal is characterized by comprising an antireflective film (6), which at least contains silicon and oxygen and/or nitrogen, on the light-shielding film (3).
Inventors:
Mitsuhiro Kureishi
Hideaki Mitsui
Hideaki Mitsui
Application Number:
JP2009102116A
Publication Date:
April 04, 2012
Filing Date:
April 20, 2009
Export Citation:
Assignee:
HOYA CORPORATION
International Classes:
G03F1/54; C23C14/06; G03F1/32; G03F1/46; G03F1/68; G03F7/20; H01L21/027
Domestic Patent References:
| JP7159974A | ||||
| JP6095363A | ||||
| JP2000181049A | ||||
| JP2002156743A | ||||
| JP2003107675A | ||||
| JP2002229176A | ||||
| JP4009847A | ||||
| JP59139034A |
Attorney, Agent or Firm:
Makoto Hagiwara