Title:
ポジ型感光性組成物及び永久レジスト
Document Type and Number:
Japanese Patent JP4960330
Kind Code:
B2
Abstract:
A positive photosensitive composition which comprises (A) a silicone resin bearing, in one molecule, at least two groups represented by general formula (1) [wherein R1 is a C1-10 alkylene group which may have a substituent hydrocarbon group; R2 is a C1-4 alkyl group; a is a number of 0 or 1 to 4; and b is a number of 1 to 3, with the proviso that the sum of a and b does not exceed 5], (B) a siloxane compound bearing a glycidyl group, (C) a diazonaphthoquinone, and (D) an organic solvent. The permanent resist is produced by applying the positive photosensitive composition to a substrate, exposing the coated substrate to light, and then subjecting the resulting coated substrate to alkali development and then to post-baking at 120 to 350°C.
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Inventors:
Seiichi Saito
Hiroshi Morita
Hiromi Takenouchi
Jun Kobayashi
Jinichi Omi
Hiroshi Morita
Hiromi Takenouchi
Jun Kobayashi
Jinichi Omi
Application Number:
JP2008270972A
Publication Date:
June 27, 2012
Filing Date:
October 21, 2008
Export Citation:
Assignee:
ADEKA CORPORATION
International Classes:
G03F7/075; C08G77/16; G02F1/1333; G03F7/004; G03F7/023; G03F7/40; H01L21/027; H01L51/50; H05B33/22
Domestic Patent References:
| JP62239440A | ||||
| JP61144639A | ||||
| JP2006178436A |
Attorney, Agent or Firm:
Osamu Hatori