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Title:
異なる検査パラメータを使用する試験片の検査のための方法とシステム
Document Type and Number:
Japanese Patent JP5006040
Kind Code:
B2
Abstract:
Methods and systems for inspection of a specimen using different parameters are provided. One computer-implemented method includes determining optimal parameters for inspection based on selected defects. This method also includes setting parameters of an inspection system at the optimal parameters prior to inspection. Another method for inspecting a specimen includes illuminating the specimen with light having a wavelength below about 350 nm and with light having a wavelength above about 350 nm. The method also includes processing signals representative of light collected from the specimen to detect defects or process variations on the specimen. One system configured to inspect a specimen includes a first optical subsystem coupled to a broadband light source and a second optical subsystem coupled to a laser. The system also includes a third optical subsystem configured to couple light from the first and second optical subsystems to an objective, which focuses the light onto the specimen.

Inventors:
Lange, Steve Earle
Marella, Paul Frank
Seglio nut
Juan, Shiou-Hway
Huh, Tao-i
Application Number:
JP2006525531A
Publication Date:
August 22, 2012
Filing Date:
September 03, 2004
Export Citation:
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Assignee:
KLA-Tenker Corporation
International Classes:
G01N21/956; G01N21/95; G03F1/84; H01L21/66
Domestic Patent References:
JP11295233A
JP2003232749A
JP200248722A
JP2001250852A
JP2002181723A
JP2002116155A
JP11142127A
JP2004531735A
JP62245484A
Attorney, Agent or Firm:
Masaki Yamakawa
Shigeki Yamakawa
Hiroro Kurokawa
Osamu Nishiyama