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Title:
生体吸収性の移植可能な基体
Document Type and Number:
Japanese Patent JP5022039
Kind Code:
B2
Abstract:
Provided is a method of producing a bioabsorbable, implantable substrate having a graded molecular weight distribution, comprising exposing at least a portion of the implantable substrate to electron beam irradiation. There is also provided a bioabsorbable, implantable substrate comprising a bioabsorbable polymer having a graded molecular weight distribution through at least a portion of its thickness.

Inventors:
ブチャナン, フレイザー, ジェームス
Application Number:
JP2006552684A
Publication Date:
September 12, 2012
Filing Date:
February 10, 2005
Export Citation:
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Assignee:
ザ クイーンズ ユニヴァーシティ オブ ベルファスト
International Classes:
A61L27/00; A61K47/34; A61L2/08; A61L27/50; B29C35/02; B29C71/04; C08G63/88; C08J3/24; C08J3/28; C08J7/00; A61F2/00; A61F13/00; B29C35/08
Domestic Patent References:
JP60012068A
JP2000505338A
JP9510903A
Foreign References:
WO2004009146A1
WO2002018490A1
Attorney, Agent or Firm:
山田 行一
野田 雅一