Title:
光学的薄膜を形成する方法及び装置
Document Type and Number:
Japanese Patent JP5046074
Kind Code:
B2
Abstract:
In a method for applying coatings to the front surface of a substrate (10) in a vacuum chamber by sputtering, during or after formation of a front side transition layer (TL) (12), precursors (PR) for mechanical property modifying reaction products (RP) (14) for incorporation into TL are supplied to the vacuum chamber at a gas phase concentration such that (a) deposition of PR and/or RP without simultaneous sputtering is suppressed and (b) during sputtering the deposition of PR and/or RP occurs (almost) exclusively in a region opposite to the sputtering target (preferably on the front surface of the substrate). An independent claim is included for apparatus for the process, comprising an evacuable vacuum chamber with a precursor inlet, via which a predetermined concentration of precursors is supplied using a control device.
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Inventors:
Breme Frank
Application Number:
JP2005320834A
Publication Date:
October 10, 2012
Filing Date:
November 04, 2005
Export Citation:
Assignee:
Satisloh AG
International Classes:
C23C14/02; C23C14/06; C23C14/22; G02B1/11
Domestic Patent References:
| JP2001073130A | ||||
| JP10230558A | ||||
| JP2000026139A | ||||
| JP2005511893A |
Foreign References:
| WO2003048406A1 |
Attorney, Agent or Firm:
Calyx
Miyazaki Yoshio
Kaoru Onozuka
Akio Tagami
High Masahiro
Toshio Nakamura
Tsutomu Kato
Yusuke Murakoshi
Tomoaki Komiya
Miyazaki Yoshio
Kaoru Onozuka
Akio Tagami
High Masahiro
Toshio Nakamura
Tsutomu Kato
Yusuke Murakoshi
Tomoaki Komiya