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Title:
固体撮像装置の製造方法および半導体装置の製造方法
Document Type and Number:
Japanese Patent JP5050512
Kind Code:
B2
Abstract:

To contrive a reduction in 1/f noise due to an amplifier transistor constituting a pixel, as the miniaturization of a MOS type image sensor advances.

A solid-state imaging apparatus includes the arrangement of unit pixels including a photoelectric conversion element and an amplifier transistor for amplifying signals according to the electric charge obtained through photoelectric conversion by the photoelectric conversion element and outputting them. The channel region of the amplifier transistor is formed away from an element isolation region, and/or the channel region of the amplifier transistor has a plurality of channel regions, i.e. at least two kinds of channel regions that are a first channel region and a second channel region.

COPYRIGHT: (C)2008,JPO&INPIT


Inventors:
Soichiro Itonaga
Application Number:
JP2006328683A
Publication Date:
October 17, 2012
Filing Date:
December 05, 2006
Export Citation:
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Assignee:
ソニー株式会社
International Classes:
H01L27/146; H04N5/335; H04N5/341; H04N5/357; H04N5/369; H04N5/374; H04N5/3745; H04N5/376
Domestic Patent References:
JP2006120679A
JP2003332892A
Attorney, Agent or Firm:
Yoshitsuno Kakuda
Hitoshi Ito



 
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