Title:
薄膜の製造方法及び電子放出素子の製造方法
Document Type and Number:
Japanese Patent JP5072220
Kind Code:
B2
Abstract:
To provide a method of forming a thin film comprising steps of: applying on a substrate a liquid containing a component for forming a thin film; drying the liquid to form a precursor of the thin film; and heating the precursor to form the thin film, wherein the heating step is conducted after absorbing into the precursor vapor of water or an organic compound.
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Inventors:
Ryoji Kondo
Application Number:
JP2005351575A
Publication Date:
November 14, 2012
Filing Date:
December 06, 2005
Export Citation:
Assignee:
Canon Inc
International Classes:
H01B13/00; B05D1/26; H01J9/02
Domestic Patent References:
| JP2001297639A |
Attorney, Agent or Firm:
Keisuke Watanabe
Yoshihiro Yamaguchi
Yoshihiro Yamaguchi