Title:
成膜装置、成膜方法及び記憶媒体
Document Type and Number:
Japanese Patent JP5083193
Kind Code:
B2
Abstract:
In a film deposition apparatus, a turntable is disposed in a vacuum container and includes a substrate placement area in which a substrate is placed. A substrate heating unit is disposed to heat the substrate placed on the turntable. First and second reactive gas supplying units are disposed at mutually distant locations in a rotational direction of the turntable to respectively supply first and second reactive gases to first and second processing areas adjacent to the substrate placement area. A separation gas supplying unit is disposed to supply a separation gas to a separation area located between the first and second processing areas in the rotational direction. An exhaust port is arranged to exhaust the first and second reactive gases and the separation gas from the turntable. A temperature control part is arranged to heat or cool the vacuum container.
Inventors:
Kazuki Ohara
Manabu Honma
Manabu Honma
Application Number:
JP2008317514A
Publication Date:
November 28, 2012
Filing Date:
December 12, 2008
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
H01L21/31; C23C16/44; C23C16/46; H01L21/316
Domestic Patent References:
| JP2007247066A | ||||
| JP9125251A | ||||
| JP2002353154A | ||||
| JP2008524842A | ||||
| JP2008270589A |
Attorney, Agent or Firm:
Toshio Inoue