Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
シリコン精製装置
Document Type and Number:
Japanese Patent JP5148784
Kind Code:
B1
More Like This:
JP2014076927CONTAMINANT REMOVAL FURNACE
JP2014073916METHOD FOR PRODUCING SOG SILICON
JP2007314389SILICON REFINING METHOD
Inventors:
Yoshihiko Nagata
Yuji Yamazaki
Makino Hideo
Application Number:
JP2012530812A
Publication Date:
February 20, 2013
Filing Date:
February 13, 2012
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
Sharp Corporation
International Classes:
C01B33/037
Domestic Patent References:
JP2000351616A2000-12-19
JP2001223172A2001-08-17
JPH02204320A1990-08-14
Attorney, Agent or Firm:
Fukami patent office



 
Previous Patent: JPS5148783

Next Patent: METHOD FOR BLEACHING LIGNOCELLULOSECONTAINING PULP