Title:
モデルベースのサブ解像度補助パターン(MB-SRAF)の改良された生成及び配置のために信号強度を高めるための方法及び装置
Document Type and Number:
Japanese Patent JP5198588
Kind Code:
B2
Abstract:
Model-Based Sub-Resolution Assist Feature (SRAF) generation process and apparatus are disclosed, in which an SRAF guidance map (SGM) is iteratively optimized to finally output an optimized set of SRAFs as a result of enhanced signal strength obtained by iterations involving SRAF polygons and SGM image. SRAFs generated in a prior round of iteration are incorporated in a mask layout to generate a subsequent set of SRAFs. The iterative process is terminated when a set of SRAF accommodates a desired process window or when a predefined process window criterion is satisfied. Various cost functions, representing various lithographic responses, may be predefined for the optimization process.
Inventors:
Min-Chun Tsai
Vane-Dar Chen
Yen-Wenru
Vane-Dar Chen
Yen-Wenru
Application Number:
JP2011002116A
Publication Date:
May 15, 2013
Filing Date:
January 07, 2011
Export Citation:
Assignee:
AS M Netherlands B.V.
International Classes:
G03F1/36; H01L21/027
Domestic Patent References:
| JP2009031320A | ||||
| JP2005352365A | ||||
| JP2003322945A | ||||
| JP2005026701A | ||||
| JP2004133426A | ||||
| JP2003303742A |
Foreign References:
| WO2008151185A1 |
Attorney, Agent or Firm:
Sakaki Morishita