Title:
酸化チタンを主成分とする薄膜及び酸化チタンを主成分とする焼結体スパッタリングターゲット
Document Type and Number:
Japanese Patent JP5214745
Kind Code:
B2
Abstract:
A thin film comprising titanium oxide as its main component, wherein the thin film includes titanium, oxygen and copper, content of Ti is 29.0 at% or higher and 34.0 at% or less and content of Cu is 0.003 at% or higher and 7.7 at% or less with remainder being oxygen and unavoidable impurities, and ratio of oxygen component to metal components, O/(2 Ti + 0.5 Cu), is 0.96 or higher. This invention aims to obtain a thin film comprising titanium oxide as its main component with a high refractive index and low extinction coefficient and a sintered compact sputtering target comprising titanium oxide as its main component which is suitable for producing the foregoing thin film, to obtain a thin film with superior transmittance and low reflectance and which is effective as an interference film or protective film of an optical information recording medium, and to obtain a thin film that can be applied to a glass substrate; that is, a thin film that can be used as a heat ray reflective film, antireflection film, and interference filter.
Inventors:
Hideo Takami
Masataka Yahagi
Masataka Yahagi
Application Number:
JP2010549450A
Publication Date:
June 19, 2013
Filing Date:
January 29, 2010
Export Citation:
Assignee:
jx Nippon Mining & Metals Co., Ltd.
International Classes:
C23C14/08; C04B35/46; C23C14/34; G11B7/254; G11B7/2545; G11B7/257
Domestic Patent References:
| JP2001240960A | 2001-09-04 | |||
| JP2002145622A | 2002-05-22 | |||
| JP2006144052A | 2006-06-08 | |||
| JPH08287515A | 1996-11-01 | |||
| JP2002206164A | 2002-07-26 |
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Attorney, Agent or Firm:
Isamu Ogoshi