Title:
MEMSキャビティ被覆層および方法
Document Type and Number:
Japanese Patent JP5307734
Kind Code:
B2
Abstract:
Devices, methods, and systems comprising a MEMS device, for example, an interferometric modulator, that comprises a cavity in which a layer coats multiple surfaces. The layer is conformal or non-conformal. In some embodiments, the layer is formed by atomic layer deposition (ALD). Preferably, the layer comprises a dielectric material. In some embodiments, the MEMS device also exhibits improved characteristics, such as improved electrical insulation between moving electrodes, reduced stiction, and/or improved mechanical properties.
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Inventors:
Anna Earl Rundergun
Bangalore Earl Natarajan
Evgeny goosev
James Randolph Webster
David Heald
Bangalore Earl Natarajan
Evgeny goosev
James Randolph Webster
David Heald
Application Number:
JP2009554632A
Publication Date:
October 02, 2013
Filing Date:
March 07, 2008
Export Citation:
Assignee:
Qualcomm Mems Technologies Incorporated
International Classes:
G02B26/02; B81B3/00; B81C1/00
Domestic Patent References:
| JP2006099073A | ||||
| JP2004053852A |
Foreign References:
| WO2006091860A1 | ||||
| US20050012975 |
Attorney, Agent or Firm:
Yasuhiko Murayama
Masatake Shiga
Takashi Watanabe
Shinya Mitsuhiro
Masatake Shiga
Takashi Watanabe
Shinya Mitsuhiro