Title:
フォトレジスト用の反射防止膜組成物
Document Type and Number:
Japanese Patent JP5320624
Kind Code:
B2
Abstract:
The present invention relates to a coating solution comprising a polymer obtained by reacting a glycoluril compound with at least one reactive compound containing at least one hydroxy group and/or at least one acid group, and further where the polymer is soluble in an organic solvent. The invention also relates to a process for imaging a photoresist coated over such a coating composition and to a polymer for the coating composition.
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Inventors:
Wu Hempen
Din-Lee Shuge
Zian Tson
Hishida Aritaka
Shan Jiangyi
Tsang Hong
Din-Lee Shuge
Zian Tson
Hishida Aritaka
Shan Jiangyi
Tsang Hong
Application Number:
JP2007531874A
Publication Date:
October 23, 2013
Filing Date:
September 15, 2005
Export Citation:
Assignee:
az Electronic Materials ip Co., Ltd.
International Classes:
C09D171/08; C08G65/34; C09D7/12; G03F7/038; G03F7/095; G03F7/11
Domestic Patent References:
| JP2004126161A | ||||
| JP2000187331A | ||||
| JP2006341590A |
Attorney, Agent or Firm:
Mitsufumi Esaki
Blacksmith
Katsunori Uenishi
Ichiro Torayama
Blacksmith
Katsunori Uenishi
Ichiro Torayama