Title:
欠陥修正装置および欠陥修正方法
Document Type and Number:
Japanese Patent JP5353179
Kind Code:
B2
Abstract:
A defect repair apparatus includes a defect detection unit, a database, a defect repair unit, and a control unit. The defect detection unit inspects a multilayer substrate on which a repetitive pattern is formed and extracts positional information on a defect in the repetitive pattern and feature information on the defect. In the database, a plurality of defect repair techniques are registered. The defect repair unit repairs the defect of the multilayer substrate by a defect repair technique specified. The control unit reads a defect repair technique for the defect detected by the defect detection unit and controls the defect repair unit that repairs the defect by using the defect repair technique.
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Inventors:
Akiko Tsutsui
Application Number:
JP2008272528A
Publication Date:
November 27, 2013
Filing Date:
October 22, 2008
Export Citation:
Assignee:
ソニー株式会社
International Classes:
G09F9/00; G01N21/956; G02F1/13
Domestic Patent References:
| JP2008159930A | ||||
| JP2004501505A |
Attorney, Agent or Firm:
Yoshitsuno Kakuda
Hitoshi Ito
Hitoshi Ito