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Title:
焼結体の製造方法、焼結体ターゲット及びスパッタリングターゲット-バッキングプレート組立体
Document Type and Number:
Japanese Patent JP5396276
Kind Code:
B2
Abstract:
Provided is a method of producing a sintered compact including the steps of mixing raw material powders respectively composed of a chalcogenide element and a Vb group element or raw material powders of an alloy of two or more elements including a chalcogenide element and a Vb group element, and hot pressing the mixed powder under conditions that satisfy the following formula: P(pressure) ‰¦{Pf/(Tf-T 0 )} × (T-T 0 ) + P 0 (Pf: final pressure, Tf: final temperature, P 0 : atmospheric pressure, T: heating temperature, T 0 : room temperature, and temperatures in Celsius). This method is able to produce a high-density, high-strength and large-diameter sintered compact containing a chalcogenide element (A) and a Vb group element (B) or containing the element (A) and (B) and additionally a IVb group element (C) and/or an additive element (D) which is free from cracks even when it is assembled and used as a sputtering target-backing plate assembly. Additionally disclosed are such a sintered compact, a sputtering target configured of such a sintered compact, and a sputtering target-backing plate assembly.

Inventors:
Hideyuki Takahashi
Application Number:
JP2009532101A
Publication Date:
January 22, 2014
Filing Date:
July 17, 2008
Export Citation:
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Assignee:
jx Nippon Mining & Metals Co., Ltd.
International Classes:
B22F3/14; B22F1/00; B22F7/08; C22C1/04; C23C14/34; C22C12/00
Domestic Patent References:
JP2004162109A2004-06-10
JP2004130541A2004-04-30
JP2001098366A2001-04-10
JPH09111363A1997-04-28
JP2004162109A2004-06-10
JP2004130541A2004-04-30
JP2001098366A2001-04-10
JPH09111363A1997-04-28
Foreign References:
WO2006059429A12006-06-08
WO2006077692A12006-07-27
WO2006059429A12006-06-08
WO2006077692A12006-07-27
Attorney, Agent or Firm:
Isamu Ogoshi



 
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