Title:
無端状パターンの作製方法
Document Type and Number:
Japanese Patent JP5408649
Kind Code:
B2
More Like This:
| JP5547755 | A liquid immersion lithography device and a device manufacturing method |
| WO/1993/016412 | NEW NONSILVER X-RAY RECORDING PROCESS |
| WO/2004/031857 | METHOD FOR CORRECTING MASK PATTERN |
Inventors:
Atsushi Taniguchi
Application Number:
JP2009038631A
Publication Date:
February 05, 2014
Filing Date:
February 20, 2009
Export Citation:
Assignee:
Tokyo University of Science
International Classes:
G03F7/20; B29C33/40; B29C59/04; H01L21/027; B29L11/00
Domestic Patent References:
| JP2007507725A | ||||
| JP2007505356A | ||||
| JP2007030497A | ||||
| JP2010137358A | ||||
| JP2005012040A | ||||
| JP2004039122A | ||||
| JP2006198779A | ||||
| JP2001056568A |
Attorney, Agent or Firm:
Atsushi Nakajima
Kato Kazunori
Katsuichi Nishimoto
Hiroshi Fukuda
Kato Kazunori
Katsuichi Nishimoto
Hiroshi Fukuda