Title:
微細構造体の作製方法
Document Type and Number:
Japanese Patent JP5458241
Kind Code:
B2
Abstract:
The disclosed method for producing a microstructure can form a complicated three-dimensionally formed microstructure with few steps. A first mask pattern (22) containing a light transmitting section and a light blocking section is disposed along an unexposed photosensitive resin (42), and a second mask pattern (32) containing a light transmitting section and a light blocking section is disposed on the reverse side of the first mask pattern (22) from the photosensitive resin (42). Additionally, by means of integrally rotating the photosensitive resin (42) and the first mask pattern (22) around a central axis (Z) that passes through the photosensitive resin (42) and the first mask pattern (22), and at the same time radiating exposure light from the reverse side of the second mask pattern (32) from the photosensitive resin (42) and the first mask pattern (22) in a direction that is inclined obliquely with respect to the direction of the central axis (Z), the light beam of the exposure light that is transmitted through the light transmitting section of the second mask pattern (32) and the light transmitting section of the first mask pattern (22) exposes the photosensitive resin (42).
Inventors:
Takaaki Suzuki
Hidetoshi Kodera
Kamino Isaku
Daisuke Hiramaru
Hidetoshi Kodera
Kamino Isaku
Daisuke Hiramaru
Application Number:
JP2011536166A
Publication Date:
April 02, 2014
Filing Date:
October 14, 2010
Export Citation:
Assignee:
Kyoto University
National University Corporation Kagawa University
National University Corporation Kagawa University
International Classes:
G03F7/20
Domestic Patent References:
| JPH06176408A | 1994-06-24 | |||
| JPH10305670A | 1998-11-17 | |||
| JP2008129558A | 2008-06-05 | |||
| JP2007501951A | 2007-02-01 | |||
| JPH09283434A | 1997-10-31 | |||
| JPH06509530A | 1994-10-27 |
Foreign References:
| WO2009044901A1 | 2009-04-09 | |||
| WO2006098430A1 | 2006-09-21 |
Other References:
JPN6010065556; Ｍａｎｈｅｅ Ｈａｎ， Ｗｏｏｎｓｅｏｂ Ｌｅｅ， Ｓｕｎｇ-Ｋｅｕｎ Ｌｅｅ， Ｓｅｕｎｇ Ｓ． Ｌｅｅ: '３Ｄ ｍｉｃｒｏｆａｂｒｉｃａｔｉｏｎ ｗｉｔｈ ｉｎｃｌｉｎｅｄ／ｒｏｔａｔｅｄ ＵＶ ｌｉｔｈｏｇｒａｐｈｙ' ＳＥＮＳＯＲＳ ＡＮＤ ＡＣＴＵＡＴＯＲＳ Ａ Ｖｏｌ．１１１， ｉｓｓｕｅ １, 20040301, １４-２０, ＥＬＳＥＶＩＥＲ
JPN6010065561; 花井 計，中原 崇，鈴木 慎也，松本 佳宣: '傾斜回転露光法による三次元加工法' 電気学会論文誌 Ｅ Ｖｏｌ．１２６， Ｎｏ．６, 20060601, ２２２-２２７, 社団法人 電気学会
JPN6010065561; 花井 計，中原 崇，鈴木 慎也，松本 佳宣: '傾斜回転露光法による三次元加工法' 電気学会論文誌 Ｅ Ｖｏｌ．１２６， Ｎｏ．６, 20060601, ２２２-２２７, 社団法人 電気学会
Attorney, Agent or Firm:
Toshinori Yamamoto