Title:
ポジ型レジスト材料及びパターン形成方法
Document Type and Number:
Japanese Patent JP5518803
Kind Code:
B2
Inventors:
Jun Hatakeyama
Application Number:
JP2011160785A
Publication Date:
June 11, 2014
Filing Date:
July 22, 2011
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
G03F7/039; C08F220/36; H01L21/027
Domestic Patent References:
| JP2003252929A | ||||
| JP11513740A |
Foreign References:
| KR1020090087758A |
Attorney, Agent or Firm:
Mikio Yoshimiya