Title:
ポジ型レジスト組成物およびそれを用いたレジストパターン形成方法、並びに含フッ素高分子化合物
Document Type and Number:
Japanese Patent JP5568258
Kind Code:
B2
Abstract:
A fluorine-containing polymeric compound which contains a structural unit (f1) that is decomposable in an alkali developing solution as a block copolymer portion, a base component (A) that exhibits increased solubility in an alkali developing solution under the action of acid, and an acid generator component (B) that generates acid upon exposure.
Inventors:
Yu Matsumiya
Daishi Shiono
Tomoyuki Hirano
Naohiro Dazai
Daishi Shiono
Tomoyuki Hirano
Naohiro Dazai
Application Number:
JP2009159073A
Publication Date:
August 06, 2014
Filing Date:
July 03, 2009
Export Citation:
Assignee:
Tokyo Ohka Kogyo Co., Ltd.
International Classes:
G03F7/039; G03F7/004; H01L21/027
Domestic Patent References:
| JP2010230891A | ||||
| JP2010002839A | ||||
| JP6083079A | ||||
| JP2010250105A | ||||
| JP2008111103A | ||||
| JP2007246600A |
Attorney, Agent or Firm:
Sumio Tanai
Masatake Shiga
Suzuki Mitsuyoshi
Mitsunaga Igarashi
Masatake Shiga
Suzuki Mitsuyoshi
Mitsunaga Igarashi