Title:
濃度が均一な半導体リソグラフィー用共重合体溶液の製造方法
Document Type and Number:
Japanese Patent JP5591465
Kind Code:
B2
Abstract:
A method of producing a copolymer solution for semiconductor lithography having a copolymer and a solvent for coating film formation, which copolymer contains at least one repeating unit selected from the group consisting of: a repeating unit (A) having a hydroxyl group; a repeating unit (B) having a structure in which a hydroxyl group is protected by a group which suppresses dissolution into an alkaline developer and which dissociates in the action of an acid; a repeating unit (C) having a lactone structure; and a repeating unit (D) having a cyclic ether structure, the difference in the copolymer concentration among a plurality of containers which were filled with copolymer solution from the same manufacturing lot is not more than a certain range, or the method includes a certain production step.
Inventors:
Mountain Shore 孝 Rule
加 藤 1 郎
Rice field Inside Dawn Child
浅 Field Miyako
加 藤 1 郎
Rice field Inside Dawn Child
浅 Field Miyako
Application Number:
JP2008280241A
Publication Date:
September 17, 2014
Filing Date:
October 30, 2008
Export Citation:
Assignee:
Maruzen Petrochemical Co., Ltd.
International Classes:
C08J3/09; H01L21/027; G03F7/039
Attorney, Agent or Firm:
Kenji Yoshitake
Yukitaka Nakamura
Akio Konno
Nobutaka Yokota
Yukitaka Nakamura
Akio Konno
Nobutaka Yokota