Title:
化学気相成長法を用いて基板をコーティングするデバイス及び方法
Document Type and Number:
Japanese Patent JP5603340
Kind Code:
B2
Abstract:
The invention relates to a device for coating a substrate using CVD, in particular for coating with diamond or silicon, wherein a neat conductor array composed of a plurality of elongated heat conductors (2) is provided in a housing (9), said heat conductors extending between a first (1) and a second electrode (6), wherein the heat conductors are held individually tensioned by a weight (4) attached to one end thereof. To increase the life of the neat conductors (2), the invention proposes that the weight (4) or the heat conductor (2) be guided at the second electrode (6), forming an electrical loop contact, in such a way that a vector of the weight force (G) produced by the weight (4) makes an angle (α) of no more than 45° with a direction of the longitudinal extension of the heat conductor (2).
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Inventors:
Martin リュッファー
Stefan ロズィヴァル
Christiane バライス
Walter Reichert
Oliver Lemmer
Mark ペルレ
Stefan ロズィヴァル
Christiane バライス
Walter Reichert
Oliver Lemmer
Mark ペルレ
Application Number:
JP2011536835A
Publication Date:
October 08, 2014
Filing Date:
November 13, 2009
Export Citation:
Assignee:
ディアッコン ゲーエムベーハー DiaCCon GmbH
ツェメコン アーゲー CemeCon AG
ツェメコン アーゲー CemeCon AG
International Classes:
C30B29/04; C01B31/06; C23C16/44; C30B25/10; C30B29/06
Attorney, Agent or Firm:
Yoshiaki Nishiyama